Japanese Journal of Applied Physics Issues Research Articles in August 2024 Issue
September 19, 2024
September 19, 2024
TOKYO, Japan, Sept. 19 -- The Japanese Journal of Applied Physics, a peer-reviewed journal from the Japan Society of Applied Physics, published research articles on the following topics in its August 2024 issue (Vol. 63, No. 8):
Progress Review
* Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications
Rapid Communications
* Monomer diffusion tendencies in complex- . . .
Progress Review
* Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications
Rapid Communications
* Monomer diffusion tendencies in complex- . . .